Our laser is ideal for EUV Lithography applications.
We’ll help the semiconductor industry keep Moore’s Law alive with a high-power laser that is close to 2 orders of magnitude more efficient than that manufactured for extreme ultraviolet (EUV) lithography in the semiconductor industry by the German laser company Trumpf for Dutch company ASML.
That efficiency improvement translates into less than half the power draw, thermal management and footprint, in a configuration free of the limits that current laser technology suffers from to scale power into the many 10s of kilowatts.
Contact us to find out more.